Silicon Devices and Process Integration
Compiled from industrial and academic lecture notes and reflecting years of experience in the development of silicon devices, this book covers both their theoretical and practical aspects, and how their electrical properties and processing conditions interact.7.6 Bipolar structures after NPN, PNP emitter polysilicon patterning is patterned and dry-etched through the nitride. ... The NMOS source and drain serve as contacts to the PNP base, NPN collector, polysilicon resistor and capacitor contacts.
| Title | : | Silicon Devices and Process Integration |
| Author | : | Badih El-Kareh |
| Publisher | : | Springer Science & Business Media - 2009-01-09 |
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